Expertises
Silicon
Micromachining
Fabrication
Silicon
Photodiodes
Boron
Color
Boron
Masks
Diodes
Metals
Substrates
Turnaround Time
Electrons
Verbonden aan
Publicaties
Recent
Nanver, L. K., Liu, X., & Knežević, T. (2018). Test structures without metal contacts for DC measurement of 2D-materials deposited on silicon. In 2018 IEEE International Conference on Microelectronic Test Structures (ICMTS) (pp. 69-74). (IEEE International Conference on Microelectronic Test Structures (ICMTS)). Piscataway, NJ: IEEE. DOI: 10.1109/ICMTS.2018.8383767
Nanver, L. K., Lyon, K., Liu, X., Italiano, J., & Huffman, J. (2018). Material Reliability of Low-Temperature Boron Deposition for PureB Silicon Photodiode Fabrication. MRS Advances. DOI: 10.1557/adv.2018.506
Liu, X., Nanver, L. K., & Scholtes, T. L. M. (2017). Nanometer-Thin Pure Boron Layers as Mask for Silicon Micromachining. Journal of microelectromechanical systems, 26(6), 1428-1434 . DOI: 10.1109/JMEMS.2017.2764322
Liu, X., & Nanver, L. K. (2016). Comparing current flows in ultrashallow pn-/Schottky-like diodes with 2-diode test method. In Microelectronic Test Structures (ICMTS), 2016 International Conference on (pp. 190-195). New York: IEEE. DOI: 10.1109/ICMTS.2016.7476205
Pure Link
Contactgegevens
Bezoekadres
Universiteit Twente
Faculteit Elektrotechniek, Wiskunde en Informatica
Carré
(gebouwnr. 15), kamer 2732
Hallenweg 23
7522NH Enschede
Postadres
Universiteit Twente
Faculteit Elektrotechniek, Wiskunde en Informatica
Carré
2732
Postbus 217
7500 AE Enschede