Carré

dr. A.Y. Kovalgin (Alexey)

Universitair hoofddocent
EEMCS-EE-IDS
Carré C2609
a.y.kovalgin@utwente.nl
+31534892841
Visitekaartje

Expertises

  • Material Science

    • Temperature
    • Tungsten
    • Electrical Resistivity
    • Thin Films
    • Surface
    • Aluminum Nitride

  • Chemistry

    • Atomic Layer Epitaxy
    • Liquid Film

Organisaties

Publicaties

2024

Electrical behavior of ALD-molybdenum films in the thin-film limit (2024)In 2024 IEEE 36th International Conference on Microelectronic Test Structures, ICMTS 2024 - Proceedings (IEEE International Conference on Microelectronic Test Structures). IEEE. Van Der Zouw, K., Dulfer, S. D., Aarnink, A. A. I. & Kovalgin, A. Y.https://doi.org/10.1109/ICMTS59902.2024.10520676Tuning Nanopores in Tubular Ceramic Nanofiltration Membranes with Atmospheric-Pressure Atomic Layer Deposition: Prospects for Pressure-Based In-Line Monitoring of Pore Narrowing (2024)Separations, 11(1). Article 24. Nijboer, M., Jan, A., Chen, M., Batenburg, K., Peper, J., Aarnink, T., Roozeboom, F., Kovalgin, A., Nijmeijer, A. & Luiten-Olieman, M.https://doi.org/10.3390/separations11010024

2023

Low-resistivity molybdenum obtained by atomic layer deposition (2023)Journal of vacuum science & technology A: vacuum, surfaces, and films, 41(5). Article 052402. van der Zouw, K., van der Wel, B. Y., Aarnink, A. A. I., Wolters, R. A. M., Gravesteijn, D. J. & Kovalgin, A. Y.https://doi.org/10.1116/6.0002804Area-Selective Low-Pressure Thermal Atomic Layer Deposition of Aluminum Nitride (2023)The Journal of physical chemistry C, 127(34), 17134-17145. van der Wel, B. Y., van der Zouw, K., Aarnink, A. A. I. & Kovalgin, A. Y.https://doi.org/10.1021/acs.jpcc.3c03063Atmospheric-pressure atomic layer deposition: recent applications and new emerging applications in high-porosity/3D materials (2023)Dalton transactions, 52(30), 10254-10277. Chen, M., Nijboer, M. P., Kovalgin, A. Y., Nijmeijer, A., Roozeboom, F. & Luiten-Olieman, M. W. J.https://doi.org/10.1039/d3dt01204bThin-film (Al)BCN materials synthesized by sequential precursor pulses to mimic atomic layer deposition (2023)AIP advances, 13(2). Article 025237. Apaydin, R. O., Aarnink, A. A. I., Gravesteijn, D. J., De Jong, M. P. & Kovalgin, A. Y.https://doi.org/10.1063/6.0002331

2021

Li intercalation into multilayer graphene with controlled defect densities (2021)Carbon trends, 4. Article 100045. Ochapski, M. W., Ataç, D., Sanderink, J. G. M., Kovalgin, A. Y. & de Jong, M. P.https://doi.org/10.1016/j.cartre.2021.100045

2020

Large scale structures in chemical vapor deposition-grown graphene on Ni thin films (2020)Thin solid films, 709. Article 138225. Ataç, D., Sanderink, J. G. M., Kinge, S., Gravesteijn, D. J., Kovalgin, A. Y. & de Jong, M. P.https://doi.org/10.1016/j.tsf.2020.138225Study of the phase nature of boron- and nitrogen-containing films by optical and photoelectron spectroscopy (2020)Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 38(4). Article 044009. Onnink, A. J., Apaydin, R. O., Aarnink, A. A. I., de Jong, M. P., Gravesteijn, D. J. & Kovalgin, A. Y.https://doi.org/10.1116/6.0000193Method of forming a device structure using selective deposition of gallium nitride and system for same (2020)[Patent › Patent]. Banerjee, S., Aarnink, A. & Kovalgin, A.https://www.freepatentsonline.com/y2020/0194253.html

Onderzoeksprofielen

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