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Zameshin, A. A., Yakshin, A. E., Sturm, J. M., Brongerma, H. H., & Bijkerk, F. (2018). Double matrix effect in Low Energy Ion Scattering from La surfaces. Applied surface science, 440, 570-579. DOI: 10.1016/j.apsusc.2018.01.174
Soroka, O., Sturm, J. M., van de Kruijs, R. W. E., Lee, C. J., & Bijkerk, F. (2018). Control of YH3 formation and stability via hydrogen surface adsorption and desorption. Applied surface science, 455, 70-74. DOI: 10.1016/j.apsusc.2018.05.134
Mund, B. K., Sturm, J. M., Lee, C. J., & Bijkerk, F. (2018). Formation of H2O on a CO2 dosed Ru(0 0 0 1) surface under Extreme Ultraviolet Light and H2. Applied surface science, 456, 538-544. DOI: 10.1016/j.apsusc.2018.06.166
Dolgov, A., Lee, C. J., Bijkerk, F., Abrikosov, A., Krivtsun, V. M., Lopaev, D., ... van Kampen, M. (2018). Plasma-assisted oxide removal from ruthenium-coated EUV optics. Journal of applied physics, 123(15), [153301]. DOI: 10.1063/1.5006771
Reinink, J., Van De Kruijs, R. W. E., & Bijkerk, F. (2018). Self-contained in-vacuum in situ thin film stress measurement tool. Review of scientific instruments, 89(5), [053904]. DOI: 10.1063/1.5021790
Stilhano Vilas Boas, C. R., Sturm, J. M., & Bijkerk, F. (2018). Oxygen diffusion characterization in ultrathin films by low energy ion scattering. Poster session presented at Physics@Veldhoven 2018, Veldhoven, Netherlands.
Van Den Bos, R. A. J. M., Reinink, J., Lopaev, D. V., Lee, C. J., Benschop, J. P. H., & Bijkerk, F. (2018). Influence of internal stress and layer thickness on the formation of hydrogen induced thin film blisters in Mo/Si multilayers. Journal of physics D: applied physics, 51(11), [115302]. DOI: 10.1088/1361-6463/aaad86
Mund, B. K., Sturm, J. M., Lee, C. J., & Bijkerk, F. (2018). Aromatic structure degradation of single layer graphene on an amorphous silicon substrate in the presence of water, hydrogen and Extreme Ultraviolet light. Applied surface science, 427(Part B), 1033-1040. DOI: 10.1016/j.apsusc.2017.09.098
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Universiteit Twente
Faculteit Technische Natuurwetenschappen
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