Expertises
Engineering & Materials Science
# Atomic Layer Deposition
# Characterization (Materials Science)
# Electric Field Effects
# Film Thickness
# Sheet Resistance
# Tungsten
Chemistry
# Electric Field Effect
# Tungsten
Verbonden aan
Publicaties
Recent
van der Wel, B. Y.
, van der Zouw, K.
, Aarnink, A. A. I.
, & Kovalgin, A. Y. (2023).
Area-Selective Low-Pressure Thermal Atomic Layer Deposition of Aluminum Nitride.
Journal of Physical Chemistry C,
127(34), 17134-17145.
https://doi.org/10.1021/acs.jpcc.3c03063
van der Zouw, K.
, van der Wel, B. Y.
, Aarnink, A. A. I.
, Wolters, R. A. M.
, Gravesteijn, D. J.
, & Kovalgin, A. Y. (2023).
Low-resistivity molybdenum obtained by atomic layer deposition.
Journal of vacuum science & technology A: vacuum, surfaces, and films,
41(5), Article 052402.
https://doi.org/10.1116/6.0002804
van der Zouw, K.
, Aarnink, A. A. I.
, Schmitz, J.
, & Kovalgin, A. Y. (2020).
Conduction and electric field effect in ultra-thin tungsten films.
IEEE Transactions on Semiconductor Manufacturing,
33(2), 202-209. Article 9016070.
https://doi.org/10.1109/TSM.2020.2976886
van der Zouw, K.
, Aarnink, A. A. I.
, Schmitz, J.
, & Kovalgin, A. Y. (2019).
Electrical characterization of hot-wire assisted atomic layer deposited Tungsten films. In
2019 IEEE 32nd International Conference on Microelectronic Test Structures, ICMTS 2019 (pp. 48-53). Article 8730954 IEEE.
https://doi.org/10.1109/ICMTS.2019.8730954
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