Expertises
Material Science
- Film Thickness
- Molybdenum
- Tungsten
- Temperature
- Electrical Resistivity
- Film
Engineering
- Thickness
- Test Structure
Organisaties
Publicaties
2024
Electrical behavior of ALD-molybdenum films in the thin-film limitIn 2024 IEEE 36th International Conference on Microelectronic Test Structures, ICMTS 2024 - Proceedings. IEEE. Van Der Zouw, K., Dulfer, S. D., Aarnink, A. A. I. & Kovalgin, A. Y.https://doi.org/10.1109/ICMTS59902.2024.10520676
2023
Low-resistivity molybdenum obtained by atomic layer deposition, Article 052402. van der Zouw, K., van der Wel, B. Y., Aarnink, A. A. I., Wolters, R. A. M., Gravesteijn, D. J. & Kovalgin, A. Y.https://doi.org/10.1116/6.0002804Area-Selective Low-Pressure Thermal Atomic Layer Deposition of Aluminum Nitride, 17134-17145. van der Wel, B. Y., van der Zouw, K., Aarnink, A. A. I. & Kovalgin, A. Y.https://doi.org/10.1021/acs.jpcc.3c03063
2020
Conduction and electric field effect in ultra-thin tungsten films, Article 9016070, 202-209. van der Zouw, K., Aarnink, A. A. I., Schmitz, J. & Kovalgin, A. Y.https://doi.org/10.1109/TSM.2020.2976886
Onderzoeksprofielen
Adres
Universiteit Twente
Nanolab (gebouwnr. 16), kamer 1003
Hallenweg 23
7522 NH Enschede
Universiteit Twente
Nanolab 1003
Postbus 217
7500 AE Enschede
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