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Soroka, O., Sturm, J. M., van de Kruijs, R. W. E., Lee, C. J., & Bijkerk, F. (2018). Control of YH3 formation and stability via hydrogen surface adsorption and desorption. Applied surface science, 455, 70-74. DOI: 10.1016/j.apsusc.2018.05.134
Reinink, J., Van De Kruijs, R. W. E., & Bijkerk, F. (2018). Self-contained in-vacuum in situ thin film stress measurement tool. Review of scientific instruments, 89(5), [053904]. DOI: 10.1063/1.5021790
Makhotkin, I. A., Sobierajski, R., Chalupský, J., Tiedtke, K., de Vries, G., Störmer, M., ... Enkisch, H. (2018). Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold. Journal of synchrotron radiation, 25(1), 77-84. DOI: 10.1107/S1600577517017362
Makhotkin, I. A., Sobierajski, R., Chalupsky, J., Tiedtke, K., de Vries, G., Störmer, M., ... Enkisch, H. (2018). Experimental study of EUV-mirror radiation damage resistance under long term FEL exposures below the single shot damage threshold. Journal of synchrotron radiation, 25(1), 77-84. DOI: 10.1107/S1600577517017362
Philipsen, V., Luong, K. V., Souriau, L., Erdmann, A., Xu, D., Evanschitzky, P., ... Hendrickx, E. (2017). Reducing extreme ultraviolet mask three-dimensional effects by alternative metal absorbers. Journal of micro/nanolithography, MEMS, and MOEMS, 16(4), [041002]. DOI: 10.1117/1.JMM.16.4.041002
van Zwol, P. J., Nasalevich, M., Voorthuijzen, W. P., Kurganova, E., Notenboom, A., Vles, D. F., ... Zande, W. J. (2017). Pellicle films supporting the ramp to HVM with EUV. In Photomask Technology 2017 (Vol. 10451). [104510O] SPIE. DOI: 10.1117/12.2280560
Nikolaev, K., Makhotkin, I. A., Yakunin, S. N., van de Kruijs, R. W. E., & Bijkerk, F. (2017). Crystal surface characterization.
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Universiteit Twente
Faculteit Technische Natuurwetenschappen
Carré
(gebouwnr. 15), kamer 2017
Hallenweg 23
7522NH Enschede
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Universiteit Twente
Faculteit Technische Natuurwetenschappen
Carré
2017
Postbus 217
7500 AE Enschede