Expertises
Engineering & Materials Science
# Aspect Ratio
# Lithography
# Masks
# Plasma Etching
Physics & Astronomy
# High Aspect Ratio
# Lithography
# Plasma Etching
Chemistry
# Etching
Verbonden aan
Publicaties
Recent
Ni, S.
, Berenschot, E. J. W.
, Westerik, P. J.
, de Boer, M. J.
, Wolf, R.
, Le-The, H.
, Gardeniers, H. J. G. E.
, & Tas, N. R. (2020).
Wafer-scale 3D shaping of high aspect ratio structures by multistep plasma etching and corner lithography.
Microsystems and Nanoengineering,
6(1), Article 25.
https://doi.org/10.1038/s41378-020-0134-6
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Contactgegevens
Bezoekadres
Universiteit Twente
Faculty of Electrical Engineering, Mathematics and Computer Science
Nanolab
(gebouwnr. 16), kamer 1011
Hallenweg 23
7522NH Enschede
Postadres
Universiteit Twente
Faculty of Electrical Engineering, Mathematics and Computer Science
Nanolab
1011
Postbus 217
7500 AE Enschede