Expertises
Material Science
- Hydrogen
- Aluminum Oxide
- Chemical Vapor Deposition
- Boron
- Film Thickness
- Silicon
- Yttrium
- Yttrium Oxide
Organisaties
Publicaties
2026
Hydrogen Radical Permeation Dynamics through Ultrathin ALD Al2O3 Layers Revealed by In Situ Ellipsometry (2026)The Journal of physical chemistry C, 130(23), 8035-8045. Wu, W., van de Kruijs, R. W. E., Gravesteijn, D. J., Houweling, Z. S., Colombi, G. & Kovalgin, A. Y.https://doi.org/10.1021/acs.jpcc.6c00522Sensing of Hydrogen Diffusion through Protective Caps: An Ellipsometric Approach to Estimate Hydrogen Content in Pd/Hf Stacks with an Al2O3Cap (2026)The Journal of physical chemistry C, 130(7), 2591-2604. Wu, W., van de Kruijs, R. W. E., Gravesteijn, D. J., Houweling, Z. S., Colombi, G. & Kovalgin, A. Y.https://doi.org/10.1021/acs.jpcc.5c06383Realization of Pure Boron/Si Diodes Through a Two-Step Low-Temperature Growth in a Home-Built LP CVD System (2026)Journal of the Electron Devices Society, 14, 176-185. Vu, T. T. H., Batenburg, K. M., Aarnink, A. A. I., Wu, W., Kovalgin, A. Y., Gravesteijn, D. J. & Hueting, R. J. E.https://doi.org/10.1109/JEDS.2026.3667184
2025
Film thickness non-uniformity and crucial role of water dosage for atomic layer deposition of yttrium oxide from yttrium cyclopentadienyl precursor (2025)[Contribution to conference › Poster] 24th EUROCVD & ALD 2025. Wu, W., van de Kruijs, R. W. E. & Kovalgin, A. Y.
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